C3Subtitles: rc3: I could not resist
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I could not resist

Resists for Electron Beam Lithography (EBL)

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Video duration
00:28:11
Language
English
Abstract
Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.
We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers.

<!DOCTYPE html>
<html>
<body>
<h2>Resists? What&apos;s that?</h2>
<ul>
<li>What are their applications</li>
<li>How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)</li>
</ul>

<h2>EBL? What&apos;s that?</h2>
<ul>
<li>How does it work</li>
<li>Pros &amp; cons: comparison between EBL (slow) photolithography (fast)</li>
<li>Which resist can I use for EBL</li>
</ul>

<h2>DIY cooking of PMMA based resists</h2>
<ul>
<li>Comparison of different solvents</li>
</ul>

<h2>Composition of different developers</h2>
<ul>
<li>Comparison of different developers</li>
</ul>

<h2>Applications</h2>
<ul>
<li>Usage as a mask</li>
<li>Usage as a structural dielectric material</li>
<li> ...(?)</li>
</ul>
<h2>The EBL exposure process</h2>
<ul>
<li>simple SEM retrofitted with an EBL controller</li>
<li>The common file formats (GDSII &amp; OASIS)</li>
<li>Scan-Gen: how to generate the proper curves for the exposure</li>
<li>Hardware: off-the-shelf embedded modules like the RedPitaya</li>
<li>Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!</li>
<li>Fiducial detection and alignment for multi-pass/multi-layer processes</li>
</ul>
<h2>Stuff comes together</h2>
<ul>
<li>walk through the complete process along a simple example</li>
</ul>

<h2>More Examples</h2>

<h2>Thanks & Credits</h2>

<h2>Q & A</h2>

</body>
</html>

Talk ID
11364
Event:
rc3
Day
4
Room
rC2
Start
2 p.m.
Duration
00:40:00
Track
Hardware & Making
Type of
lecture
Speaker
N00DL3
Talk Slug & media link
rc3-11364-i_could_not_resist
English
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English: Transcribed until

Last revision: 9 months ago