back

I could not resist

Resists for Electron Beam Lithography (EBL)

If you suspend your transcription on amara.org, please add a timestamp below to indicate how far you progressed! This will help others to resume your work!

Please do not press “publish” on amara.org to save your progress, use “save draft” instead. Only press “publish” when you're done with quality control.

Video duration
00:28:11
Language
English
Abstract
Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.
We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers.

<!DOCTYPE html>
<html>
<body>
<h2>Resists? What&apos;s that?</h2>
<ul>
<li>What are their applications</li>
<li>How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)</li>
</ul>

<h2>EBL? What&apos;s that?</h2>
<ul>
<li>How does it work</li>
<li>Pros &amp; cons: comparison between EBL (slow) photolithography (fast)</li>
<li>Which resist can I use for EBL</li>
</ul>

<h2>DIY cooking of PMMA based resists</h2>
<ul>
<li>Comparison of different solvents</li>
</ul>

<h2>Composition of different developers</h2>
<ul>
<li>Comparison of different developers</li>
</ul>

<h2>Applications</h2>
<ul>
<li>Usage as a mask</li>
<li>Usage as a structural dielectric material</li>
<li> ...(?)</li>
</ul>
<h2>The EBL exposure process</h2>
<ul>
<li>simple SEM retrofitted with an EBL controller</li>
<li>The common file formats (GDSII &amp; OASIS)</li>
<li>Scan-Gen: how to generate the proper curves for the exposure</li>
<li>Hardware: off-the-shelf embedded modules like the RedPitaya</li>
<li>Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!</li>
<li>Fiducial detection and alignment for multi-pass/multi-layer processes</li>
</ul>
<h2>Stuff comes together</h2>
<ul>
<li>walk through the complete process along a simple example</li>
</ul>

<h2>More Examples</h2>

<h2>Thanks & Credits</h2>

<h2>Q & A</h2>

</body>
</html>

Talk ID
11364
Event:
rc3
Day
4
Room
rC2
Start
2 p.m.
Duration
00:40:00
Track
Hardware & Making
Type of
lecture
Speaker
N00DL3
Talk Slug & media link
rc3-11364-i_could_not_resist
English
0.0% Checking done0.0%
0.0% Syncing done0.0%
0.0% Transcribing done0.0%
100.0% Nothing done yet100.0%
  

Work on this video on Amara!

English: Transcribed until

Last revision: 2 months, 4 weeks ago