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This talk centres on the advanced technical processes required to manufacture state-of-the-art computer chips, tracing the journey from raw materials to ultra-miniaturized circuits. We will explore each critical stage in this complex process, beginning with the refinement of ultrapure quartz and progressing through wafer production to the advanced lithography techniques that enable feature sizes down to just a few nanometers—all executed not merely in a laboratory but at an industrial scale that pushes the boundaries of what is technologically possible.
A particular emphasis will be placed on Extreme Ultraviolet (EUV) lithography, a revolutionary technique essential for achieving these ultra-small scales. EUV lithography not only represents the core technological challenge in chip fabrication but also holds a pivotal position in the global semiconductor supply chain, placing it at the intersection of scientific innovation and international politics. The talk will address both the underlying physics and the geopolitical significance of this technology, as nations increasingly view control over semiconductor production as a strategic asset.